Invention Grant
US09144150B2 Conductor structure with integrated via element 有权
具有集成通孔元件的导体结构

  • Patent Title: Conductor structure with integrated via element
  • Patent Title (中): 具有集成通孔元件的导体结构
  • Application No.: US13452600
    Application Date: 2012-04-20
  • Publication No.: US09144150B2
    Publication Date: 2015-09-22
  • Inventor: Paul Y. Wu
  • Applicant: Paul Y. Wu
  • Applicant Address: US CA San Jose
  • Assignee: XILINX, INC.
  • Current Assignee: XILINX, INC.
  • Current Assignee Address: US CA San Jose
  • Agent Kevin T. Cuenot; John J. King
  • Main IPC: H05K1/11
  • IPC: H05K1/11 H05K1/02
Conductor structure with integrated via element
Abstract:
An electrical circuit structure can include a first trace formed using a first conductive layer and a second trace formed using a second conductive layer. The first trace can be vertically aligned with the second trace. The electrical circuit structure can include a via segment formed of conductive material in a third conductive layer between the first conductive layer and the second conductive layer. The via segment can contact the first trace and the second trace forming a first conductor structure configured to convey an electrical signal in a direction parallel to the first conductive layer.
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