Invention Grant
- Patent Title: Conductor structure with integrated via element
- Patent Title (中): 具有集成通孔元件的导体结构
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Application No.: US13452600Application Date: 2012-04-20
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Publication No.: US09144150B2Publication Date: 2015-09-22
- Inventor: Paul Y. Wu
- Applicant: Paul Y. Wu
- Applicant Address: US CA San Jose
- Assignee: XILINX, INC.
- Current Assignee: XILINX, INC.
- Current Assignee Address: US CA San Jose
- Agent Kevin T. Cuenot; John J. King
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K1/02

Abstract:
An electrical circuit structure can include a first trace formed using a first conductive layer and a second trace formed using a second conductive layer. The first trace can be vertically aligned with the second trace. The electrical circuit structure can include a via segment formed of conductive material in a third conductive layer between the first conductive layer and the second conductive layer. The via segment can contact the first trace and the second trace forming a first conductor structure configured to convey an electrical signal in a direction parallel to the first conductive layer.
Public/Granted literature
- US20130277099A1 CONDUCTOR STRUCTURE WITH INTEGRATED VIA ELEMENT Public/Granted day:2013-10-24
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