Invention Grant
US09146337B2 Apparatus for speckle reduction, pulse stretching, and beam homogenization
有权
用于减少斑点，脉冲拉伸和光束均匀化的装置
- Patent Title: Apparatus for speckle reduction, pulse stretching, and beam homogenization
- Patent Title (中): 用于减少斑点，脉冲拉伸和光束均匀化的装置
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Application No.: US14137592Application Date: 2013-12-20
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Publication No.: US09146337B2Publication Date: 2015-09-29
- Inventor: Jiping Li , Aaron Muir Hunter , Bruce E. Adams , Douglas E. Holmgren , Samuel C. Howells , Theodore P. Moffitt , Stephen Moffatt
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: G02B27/10
- IPC: G02B27/10 ; G02B3/00 ; G02B27/48
Abstract:
Embodiments described herein relate to thermal processing of semiconductor substrates. More specifically, embodiments described herein relate to laser thermal processing of semiconductor substrates. In certain embodiments, a uniformizer is provided to spatially and temporally decorrelate a coherent light image.
Public/Granted literature
- US20140254022A1 APPARATUS FOR SPECKLE REDUCTION, PULSE STRETCHING, AND BEAM HOMOGENIZATION Public/Granted day:2014-09-11
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