Invention Grant
- Patent Title: Wafer support system and method for separating support substrate from solid-phase bonded wafer and method for manufacturing semiconductor device
- Patent Title (中): 用于将支撑基板与固相接合晶片分离的晶片支撑系统和方法及其制造方法
-
Application No.: US14249480Application Date: 2014-04-10
-
Publication No.: US09147599B2Publication Date: 2015-09-29
- Inventor: Tsunehiro Nakajima
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2011-228545 20111018
- Main IPC: H01L21/30
- IPC: H01L21/30 ; H01L21/762 ; H01L21/18 ; H01L21/78 ; H01L29/66 ; H01L21/84 ; H01L21/683

Abstract:
A method is disclosed for separating a support substrate from a solid-phase bonded wafer which includes a Si wafer and support substrate solid-phase bonded to back surface of the Si wafer. The method includes a step of irradiating the Si wafer with laser light with a wavelength which passes through the Si wafer and is focused on a solid-phase bonding interface between the Si wafer and support substrate to form a breaking layer in at least part of an outer circumferential portion of the solid-phase bonding interface, a step of separating the breaking layer; and a step of separating the solid-phase bonding interface. The method is capable of using a Si thin wafer without substantial wafer cracking at an initial stage where the wafer is inputted to a wafer process, capable of separating a support substrate from the Si thin wafer easily, and capable of reducing the wafer cost.
Public/Granted literature
Information query
IPC分类: