Invention Grant
US09147599B2 Wafer support system and method for separating support substrate from solid-phase bonded wafer and method for manufacturing semiconductor device 有权
用于将支撑基板与固相接合晶片分离的晶片支撑系统和方法及其制造方法

Wafer support system and method for separating support substrate from solid-phase bonded wafer and method for manufacturing semiconductor device
Abstract:
A method is disclosed for separating a support substrate from a solid-phase bonded wafer which includes a Si wafer and support substrate solid-phase bonded to back surface of the Si wafer. The method includes a step of irradiating the Si wafer with laser light with a wavelength which passes through the Si wafer and is focused on a solid-phase bonding interface between the Si wafer and support substrate to form a breaking layer in at least part of an outer circumferential portion of the solid-phase bonding interface, a step of separating the breaking layer; and a step of separating the solid-phase bonding interface. The method is capable of using a Si thin wafer without substantial wafer cracking at an initial stage where the wafer is inputted to a wafer process, capable of separating a support substrate from the Si thin wafer easily, and capable of reducing the wafer cost.
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