The present disclosure relates to an array substrate and the manufacturing method thereof, and a display apparatus. The manufacturing method of the array substrate comprises following step. A gate insulating layer and an active layer is formed on the substrate with said gate electrode and said common electrode formed thereon. A source drain layer is formed on the substrate with said gate insulating layer and said active layer formed thereon. A passivation layer is formed on the substrate with said source drain layer formed thereon, and a through hole is formed in the passivation layer; a pixel electrode is formed on the substrate with said passivation layer formed thereon with said through hole. The pixel electrode is connected to the drain electrode in the source drain layer through said through hole. The process for forming the pixel electrode comprises first etching, ashing and second etching.