Invention Grant
- Patent Title: Film structure with high oxygen barrier properties and method of manufacturing such a film structure
- Patent Title (中): 具有高氧阻隔性的膜结构和制造这种膜结构的方法
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Application No.: US13681657Application Date: 2012-11-20
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Publication No.: US09149966B2Publication Date: 2015-10-06
- Inventor: Rudi Allegaert , Dirk De Mulder
- Applicant: Rudi Allegaert , Dirk De Mulder
- Applicant Address: BE Erembodegem
- Assignee: Tekni-Plex Europe, Naamloze Vennootschap
- Current Assignee: Tekni-Plex Europe, Naamloze Vennootschap
- Current Assignee Address: BE Erembodegem
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: BE2006/0360 20060703
- Main IPC: B29D7/00
- IPC: B29D7/00 ; B29C47/06 ; B32B5/18 ; B32B27/08

Abstract:
Film structure of at least five layers, two outer layers (2) made of a polyolefin on which is each time provided, on the opposite sides, a layer (4) forming a gas barrier and whereby, between both above-mentioned gas barriers (4), is provided a layer (3) made of a foamed synthetic material, whereby the outer layers (2) consist of a mixture of a polyolefin and a binder, which makes it possible to bond this polyolefin with the layer (4) forming the gas barrier.
Public/Granted literature
- US20130221564A1 FILM STRUCTURE WIHT HIGH OXYGEN BARRIER PROPERTIES AND METHOD OF MANUFACTURING SUCH A FILM STRUCTURE Public/Granted day:2013-08-29
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