Invention Grant
- Patent Title: Method of forming high-quality hexagonal boron nitride nanosheet using multi component eutectic point system
- Patent Title (中): 使用多组分共晶点系统形成高品质六方氮化硼纳米片的方法
-
Application No.: US13976339Application Date: 2012-01-09
-
Publication No.: US09150416B2Publication Date: 2015-10-06
- Inventor: Seok-Woo Jeon , Soon-Hyung Hong , Dong-Ju Lee , Kwang-Hyun Park
- Applicant: Seok-Woo Jeon , Soon-Hyung Hong , Dong-Ju Lee , Kwang-Hyun Park
- Applicant Address: KR Daejeon
- Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Daejeon
- Agency: William Park & Associates Ltd.
- Priority: KR10-2011-0016037 20110223
- International Application: PCT/KR2012/000209 WO 20120109
- International Announcement: WO2012/115348 WO 20120830
- Main IPC: C01B21/064
- IPC: C01B21/064
Abstract:
Provided is a method of manufacturing a hexagonal boron nitride nanosheet to mass-produce a high-quality hexagonal boron nitride nanosheet at a low temperature in a safe process.The method of manufacturing a hexagonal boron nitride nanosheet includes (a) obtaining an alkali metal ion or alkali earth metal ion from a salt mixture including at least two kinds of alkali metal salt or alkali earth metal salt, (b) preparing a hexagonal boron nitride interlayer compound by inserting the alkali metal ion or alkali earth metal ion into layers of hexagonal boron nitride, and (c) obtaining a hexagonal boron nitride nanosheet by removing the alkali metal ion or alkali earth metal ion from the hexagonal boron nitride interlayer compound.
Public/Granted literature
Information query
