Invention Grant
- Patent Title: Silica crucible for pulling silicon single crystal and method of producing the same
- Patent Title (中): 用于拉硅单晶的二氧化硅坩埚及其制造方法
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Application No.: US12919732Application Date: 2009-03-02
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Publication No.: US09150447B2Publication Date: 2015-10-06
- Inventor: Atsushi Shimazu , Tadahiro Sato
- Applicant: Atsushi Shimazu , Tadahiro Sato
- Applicant Address: JP Akita
- Assignee: JAPAN SUPER QUARTZ CORPORATION
- Current Assignee: JAPAN SUPER QUARTZ CORPORATION
- Current Assignee Address: JP Akita
- Agency: Pearne & Gordon LLP
- Priority: JP2008-049920 20080229
- International Application: PCT/JP2009/053886 WO 20090302
- International Announcement: WO2009/107834 WO 20090903
- Main IPC: C30B35/00
- IPC: C30B35/00 ; C03B19/09 ; C30B15/10 ; C03C15/00

Abstract:
There is provided a silica crucible for pulling a silicon single crystal, comprising silica glass and having a two-layer structure of an outer layer and an inner layer, wherein the inner layer, in a sectional side view of the crucible, has a wavy inner surface shape having mountain parts and valley parts at least between a start position and an end position for the pulling of a silicon single crystal in a silicon melt surface, and when a distance from an upper opening end of the crucible to the start position for the pulling of the silicon single crystal is 100, only a crucible portion from the upper opening end to a position within a range of 40 to 100 is crystalline.
Public/Granted literature
- US20110011334A1 SILICA CRUCIBLE FOR PULLING SILICON SINGLE CRYSTAL AND METHOD OF PRODUCING THE SAME Public/Granted day:2011-01-20
Information query
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