Invention Grant
US09150949B2 Plasma systems and methods including high enthalpy and high stability plasmas
有权
等离子体系统和方法包括高焓和高稳定性等离子体
- Patent Title: Plasma systems and methods including high enthalpy and high stability plasmas
- Patent Title (中): 等离子体系统和方法包括高焓和高稳定性等离子体
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Application No.: US13771908Application Date: 2013-02-20
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Publication No.: US09150949B2Publication Date: 2015-10-06
- Inventor: Vladmir E. Belashchenko
- Applicant: Vladmir E. Belashchenko
- Agency: Grossman, Tucker, Perreault & Plfeger, PLLC.
- Main IPC: C23C4/12
- IPC: C23C4/12 ; B23K10/02 ; H05H1/34 ; H05H1/42
Abstract:
The present disclosure generally relates to systems, apparatus and methods of plasma spraying and plasma treatment of materials based on high specific energy molecular plasma gases that may be used to generate a selected plasma. The present disclosure is also relates to the design of plasma torches and plasma systems to optimize such methods.
Public/Granted literature
- US20130236652A1 Plasma Systems and Methods Including High Enthalpy And High Stability Plasmas Public/Granted day:2013-09-12
Information query
IPC分类:
