Invention Grant
- Patent Title: Vacuum processing apparatus
- Patent Title (中): 真空加工设备
-
Application No.: US12191373Application Date: 2008-08-14
-
Publication No.: US09150964B2Publication Date: 2015-10-06
- Inventor: Hiroyuki Kobayashi , Masaru Izawa , Kenetsu Yokogawa , Kenji Maeda
- Applicant: Hiroyuki Kobayashi , Masaru Izawa , Kenetsu Yokogawa , Kenji Maeda
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker Botts L.L.P.
- Priority: JP2008-149021 20080606
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C16/44 ; H01L21/67 ; H01L21/677
Abstract:
There is a vacuum processing apparatus which can reduce the amount of foreign particle occurrence by enhancing the ease of maintenance of a gas diffuser installing portion in the vacuum processing apparatus. A gas diffuser chamber for accommodating a gas diffuser is installed in the vacuum processing apparatus.
Public/Granted literature
- US20090301392A1 VACUUM PROCESSING APPARATUS Public/Granted day:2009-12-10
Information query
IPC分类:
