Invention Grant
US09155183B2 Adjustable slot antenna for control of uniformity in a surface wave plasma source
有权
可调缝隙天线,用于控制表面波等离子体源的均匀性
- Patent Title: Adjustable slot antenna for control of uniformity in a surface wave plasma source
- Patent Title (中): 可调缝隙天线,用于控制表面波等离子体源的均匀性
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Application No.: US13750392Application Date: 2013-01-25
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Publication No.: US09155183B2Publication Date: 2015-10-06
- Inventor: Sergey A. Voronin , Alok Ranjan
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, LLP
- Main IPC: H01Q1/26
- IPC: H01Q1/26 ; H05H1/46

Abstract:
The present invention provides a surface wave plasma source including an electromagnetic (EM) wave launcher comprising a slot antenna having a plurality of antenna slots configured to couple the EM energy from a first region above the slot antenna to a second region below the slot antenna, and a power coupling system is coupled to the EM wave launcher. A dielectric window is positioned in the second region and has a lower surface including the plasma surface. A slotted gate plate is arranged parallel with the slot antenna and is configured to be movable relative to the slot antenna between variable opacity positions including a first opaque position to prevent the EM energy from passing through the first arrangements of antenna slots, and a first transparent position to allow a full intensity of the EM energy to pass through the first arrangement of antenna slots.
Public/Granted literature
- US20140028190A1 ADJUSTABLE SLOT ANTENNA FOR CONTROL OF UNIFORMITY IN A SURFACE WAVE PLASMA SOURCE Public/Granted day:2014-01-30
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