Invention Grant
- Patent Title: Polishing liquid composition for magnetic disk substrate
- Patent Title (中): 用于磁盘基材的抛光液组合物
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Application No.: US13325938Application Date: 2011-12-14
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Publication No.: US09159352B2Publication Date: 2015-10-13
- Inventor: Yosuke Kimura , Takeshi Hamaguchi , Makoto Suzuki
- Applicant: Yosuke Kimura , Takeshi Hamaguchi , Makoto Suzuki
- Applicant Address: JP Tokyo
- Assignee: KAO CORPORATION
- Current Assignee: KAO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-280865 20101216; JP2011-204410 20110920
- Main IPC: B24D3/02
- IPC: B24D3/02 ; C09C1/68 ; C09K3/14 ; G11B5/84 ; B24B37/04

Abstract:
The present invention provides a polishing liquid composition for a magnetic disk substrate that can reduce residual inorganic particles and scratches without loss of productivity and a method of producing a magnetic disk substrate using the polishing liquid composition. The polishing liquid composition contains inorganic particles, a diallylamine polymer, an acid and water, the diallylamine polymer includes one or more constitutional units selected from those represented by the following general formulas (I-a), (I-b), (I-c) and (I-d), and the content of the diallylamine polymer in the polishing liquid composition is 0.008 to 0.100 wt %
Public/Granted literature
- US20120156968A1 POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE Public/Granted day:2012-06-21
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