Invention Grant
US09159693B2 Hybrid substrate with high density and low density substrate areas, and method of manufacturing the same 有权
具有高密度和低密度衬底区域的混合衬底及其制造方法

Hybrid substrate with high density and low density substrate areas, and method of manufacturing the same
Abstract:
Provided is a hybrid substrate with high density and low density substrate areas and a method of manufacturing the same. The hybrid substrate with high density and low density substrate areas includes a low density substrate layer having a cavity and a low density area, a high density substrate layer mounted in the cavity of the low density substrate layer and formed of a high density area having a higher pattern density than that of the low density area, an insulating support layer comprising a deposition area formed on upper portions, lower portions and the upper and lower portions of the high density substrate layer and the low density substrate layer, insulating layer vias passing through the deposition area of the insulating support layer and connected to patterns of the high density substrate layer and the low density substrate layer, and an outer pattern layer.
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