Invention Grant
- Patent Title: Solid state imaging device that includes a color filter and an interlayer dielectric layer on opposite sides of a semiconductor substrate
- Patent Title (中): 固态成像装置,其包括在半导体基板的相对侧上的滤色器和层间电介质层
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Application No.: US13783173Application Date: 2013-03-01
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Publication No.: US09160953B2Publication Date: 2015-10-13
- Inventor: Amane Oishi
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2012-157656 20120713
- Main IPC: H04N3/14
- IPC: H04N3/14 ; H04N5/335 ; H04N9/07 ; H04N9/04 ; H04N5/372 ; H01L27/146

Abstract:
A solid state imaging device includes a semiconductor substrate having an element isolating layer and a plurality of photoelectric conversion elements each formed in a respective one of a plurality of pixel regions that are isolated from each other by the element isolating layer, an interlayer dielectric layer having wires formed on a first surface of the semiconductor substrate, and a color filter layer having pigmented films of a plurality of colors, formed on a second surface of the semiconductor substrate and in the pixel regions. The element isolating layer has a part projecting from the second surface, and at least part of the pigmented films is formed in a space defined by the second surface and the projecting part of the element isolating layer.
Public/Granted literature
- US20140016012A1 SOLID STATE IMAGING DEVICE Public/Granted day:2014-01-16
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