Invention Grant
US09161427B2 Device and method for generating a plasma discharge for patterning the surface of a substrate
有权
用于产生用于图案化衬底表面的等离子体放电的装置和方法
- Patent Title: Device and method for generating a plasma discharge for patterning the surface of a substrate
- Patent Title (中): 用于产生用于图案化衬底表面的等离子体放电的装置和方法
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Application No.: US13579051Application Date: 2010-02-17
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Publication No.: US09161427B2Publication Date: 2015-10-13
- Inventor: Paulus Petrus Maria Blom , Alquin Alphons Elisabeth Stevens , Laurentia Johanna Huijbregts , Hugo Anton Marie De Haan , Antonius Hubertus Van Schijndel , Edwin Te Sligte , Nicolaas Cornelis Josephus Van Hijningen , Tom Huiskamp
- Applicant: Paulus Petrus Maria Blom , Alquin Alphons Elisabeth Stevens , Laurentia Johanna Huijbregts , Hugo Anton Marie De Haan , Antonius Hubertus Van Schijndel , Edwin Te Sligte , Nicolaas Cornelis Josephus Van Hijningen , Tom Huiskamp
- Applicant Address: NL Eindhoven
- Assignee: Vision Dynamics Holding B.V.
- Current Assignee: Vision Dynamics Holding B.V.
- Current Assignee Address: NL Eindhoven
- Agency: Banner & Witcoff, Ltd.
- International Application: PCT/NL2010/050079 WO 20100217
- International Announcement: WO2011/102711 WO 20110825
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H05H1/46 ; H05H1/44 ; C23C16/04 ; C23C16/503 ; C23C16/509 ; H05H1/24

Abstract:
Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.
Public/Granted literature
- US20130206720A1 DEVICE AND METHOD FOR GENERATING A PLASMA DISCHARGE FOR PATTERNING THE SURFACE OF A SUBSTRATE Public/Granted day:2013-08-15
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