Invention Grant
US09165781B2 Composition for forming pattern reversal film and method for forming reversal pattern
有权
用于形成图案反转膜的组合物和形成反转图案的方法
- Patent Title: Composition for forming pattern reversal film and method for forming reversal pattern
- Patent Title (中): 用于形成图案反转膜的组合物和形成反转图案的方法
-
Application No.: US14008820Application Date: 2012-02-24
-
Publication No.: US09165781B2Publication Date: 2015-10-20
- Inventor: Yasushi Sakaida , Hiroaki Yaguchi
- Applicant: Yasushi Sakaida , Hiroaki Yaguchi
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-069889 20110328
- International Application: PCT/JP2012/054587 WO 20120224
- International Announcement: WO2012/132686 WO 20121004
- Main IPC: H01L21/311
- IPC: H01L21/311 ; H01L21/308 ; C08G77/20 ; C09D183/06 ; H01L21/033 ; G03F7/075 ; G03F7/40 ; C08K5/09
Abstract:
There is provided a silicon-containing composition for forming a pattern reversal film that can be reworked by an organic solvent that is normally used for the removal of resist patterns. A composition for forming a pattern reversal film, characterized by comprising: polysiloxane; an additive; and an organic solvent, wherein the polysiloxane has a structural unit of Formula (1) and a structural unit of Formula (2): (where R1 is a C1-8 alkyl group), and (where R2 is an acryloyloxy group or a methacryloyloxy group; and n is an integer of 2 to 4), and the additive is an organic acid having at least two of a carboxy group and/or a hydroxy group; and a pattern reversal film and a method for forming a reversal pattern by use of the composition.
Public/Granted literature
- US20140017896A1 COMPOSITION FOR FORMING PATTERN REVERSAL FILM AND METHOD FOR FORMING REVERSAL PATTERN Public/Granted day:2014-01-16
Information query
IPC分类:
