Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US14015986Application Date: 2013-08-30
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Publication No.: US09165922B2Publication Date: 2015-10-20
- Inventor: Akira Yoshioka , Yasunobu Saito , Hidetoshi Fujimoto , Takeshi Uchihara , Naoko Yanase , Toshiyuki Naka , Tetsuya Ohno , Tasuku Ono
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2013-059343 20130322
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L27/095

Abstract:
According to an embodiment, a semiconductor device includes a conductive substrate, a Schottky barrier diode, and a field-effect transistor. The Schottky barrier diode is mounted on the conductive substrate and includes an anode electrode and a cathode electrode. The anode electrode is electrically connected to the conductive substrate. The field-effect transistor is mounted on the conductive substrate and includes a source electrode, a drain electrode, and a gate electrode. The source electrode of the field-effect transistor is electrically connected to the cathode electrode of the Schottky barrier diode. The gate electrode of the field-effect transistor is electrically connected to the anode electrode of the Schottky barrier diode.
Public/Granted literature
- US20140284610A1 SEMICONDUCTOR DEVICE Public/Granted day:2014-09-25
Information query
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