Invention Grant
- Patent Title: Dynamic threshold MOS and methods of forming the same
- Patent Title (中): 动态阈值MOS及其形成方法
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Application No.: US14044665Application Date: 2013-10-02
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Publication No.: US09165926B2Publication Date: 2015-10-20
- Inventor: Jam-Wem Lee
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/70
- IPC: H01L21/70 ; H01L27/088 ; H01L29/06 ; H01L21/762 ; H01L27/06 ; H01L27/12

Abstract:
A chip includes a semiconductor substrate, a well region in the semiconductor substrate, and a Dynamic Threshold Metal-Oxide Semiconductor (DTMOS) transistor formed at a front side of the semiconductor substrate. The DTMOS transistor includes a gate electrode, and a source/drain region adjacent to the gate electrode. The source/drain region is disposed in the well region. A well pickup region is in the well region, and the well pickup region is at a back side of the semiconductor substrate. The well pickup region is electrically connected to the gate electrode.
Public/Granted literature
- US20150091092A1 Dynamic Threshold MOS and Methods of Forming the Same Public/Granted day:2015-04-02
Information query
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