Invention Grant
- Patent Title: Semiconductor light-emitting device and method of forming the same
- Patent Title (中): 半导体发光器件及其形成方法
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Application No.: US14287976Application Date: 2014-05-27
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Publication No.: US09166108B2Publication Date: 2015-10-20
- Inventor: Keisuke Unosawa
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2011-268321 20111207; JP2012-218783 20120928
- Main IPC: H01L33/38
- IPC: H01L33/38 ; H01L33/62 ; H01L33/50

Abstract:
A semiconductor light-emitting device has a first principal surface, a second principal surface formed on a side opposite to the first principal surface, and a light-emitting layer. A p-electrode on the second principal surface is in the region of the light-emitting layer and surrounds an n-electrode. An insulating layer on the side of the semiconductor layer surrounds the p-and the n-electrodes. A p-metal pillar creates an electrical connection for the p-electrode, and an n-metal pillar creates an electrical connection for the n-electrode. A resin layer surrounds the end portions of the p-and the n-metal pillars, and also covers the side surface of the semiconductor layer, the second principal surface, the p-electrode, the n-electrode, the insulating layer, the p-metal pillar and the n-metal pillar.
Public/Granted literature
- US20140299909A1 SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD OF FORMING THE SAME Public/Granted day:2014-10-09
Information query
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