Invention Grant
- Patent Title: Method of forming metal oxide hardmask
- Patent Title (中): 形成金属氧化物硬掩模的方法
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Application No.: US14505290Application Date: 2014-10-02
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Publication No.: US09171716B2Publication Date: 2015-10-27
- Inventor: Hideaki Fukuda
- Applicant: ASM Japan K.K.
- Applicant Address: JP Tokyo
- Assignee: ASM JAPAN K.K.
- Current Assignee: ASM JAPAN K.K.
- Current Assignee Address: JP Tokyo
- Agency: Snell & Wilmer LLP
- Main IPC: H01L21/228
- IPC: H01L21/228 ; H01L21/02 ; H01L21/033 ; G03F1/00
Abstract:
A method of forming a metal oxide hardmask on a template includes: providing a template constituted by a photoresist or amorphous carbon formed on a substrate; and depositing by atomic layer deposition (ALD) a metal oxide hardmask on the template constituted by a material having a formula SixM(1-x)Oy wherein M represents at least one metal element, x is less than one including zero, and y is approximately two or a stoichiometrically-determined number.
Public/Granted literature
- US20150056540A1 Method of Forming Metal Oxide Hardmask Public/Granted day:2015-02-26
Information query
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