Invention Grant
- Patent Title: Method of making a semiconductor chip including identifying marks
- Patent Title (中): 制造包括识别标记的半导体芯片的方法
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Application No.: US14299481Application Date: 2014-06-09
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Publication No.: US09171806B2Publication Date: 2015-10-27
- Inventor: Joerg Ortner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L23/544 ; H01L21/26

Abstract:
A semiconductor chip includes a first mark for identifying a position of the chip within an exposure field. The semiconductor chip includes a first matrix in a first layer of the chip and a second mark within the first matrix identifying a position of the exposure field on a wafer.
Public/Granted literature
- US20140287566A1 METHOD OF MAKING A SEMICONDUCTOR CHIP INCLUDING IDENTIFYING MARKS Public/Granted day:2014-09-25
Information query
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