Invention Grant
- Patent Title: Nitride semiconductor device and method of manufacturing the same
- Patent Title (中): 氮化物半导体器件及其制造方法
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Application No.: US14198011Application Date: 2014-03-05
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Publication No.: US09171946B2Publication Date: 2015-10-27
- Inventor: June Sik Kwak , Young Do Jong , Ho Young Cha , Bong Ryeol Park , Jae Gil Lee , Kwan Hyun Lee
- Applicant: Seoul Semiconductor Co., Ltd.
- Applicant Address: KR Ansan-si
- Assignee: Seoul Semiconductor Co., Ltd.
- Current Assignee: Seoul Semiconductor Co., Ltd.
- Current Assignee Address: KR Ansan-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2013-0023429 20130305; KR10-2013-0032632 20130327
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L29/778 ; H01L29/66 ; H01L29/417 ; H01L29/06 ; H01L29/423 ; H01L29/10

Abstract:
Exemplary embodiments of the present invention disclose a unidirectional heterojunction transistor including a channel layer made of a first nitride-based semiconductor having a first energy bandgap, a barrier layer made of a second nitride-based semiconductor having a second energy bandgap different from the first energy bandgap, the barrier layer including a recess, a drain electrode disposed on a first region of the barrier layer, and a recessed-drain Schottky electrode disposed in the recess of the barrier layer, the recessed-drain Schottky electrode contacting the drain electrode.
Public/Granted literature
- US20140252370A1 NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2014-09-11
Information query
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