Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US13780486Application Date: 2013-02-28
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Publication No.: US09172017B2Publication Date: 2015-10-27
- Inventor: Toshihide Ito , Hiroshi Katsuno , Shinya Nunoue
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-207627 20120920
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/62 ; H01L33/40 ; H01L33/32 ; H01S5/042 ; H01S5/323

Abstract:
According to one embodiment, a semiconductor device includes a first semiconductor layer of an n type including a nitride semiconductor, a first metal layer of an alloy containing Al and Au, and a second metal layer. The first metal layer is in contact with the first semiconductor layer. The second metal layer is in contact with the first metal layer. The second metal layer includes a metal different from Al. The first metal layer is disposed between the second metal layer and the first semiconductor layer.
Public/Granted literature
- US20140077248A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-03-20
Information query
IPC分类: