Invention Grant
- Patent Title: Laser processing apparatus including plasma detecting means
- Patent Title (中): 包括等离子体检测装置的激光加工装置
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Application No.: US13649363Application Date: 2012-10-11
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Publication No.: US09174305B2Publication Date: 2015-11-03
- Inventor: Hiroshi Morikazu , Yoko Nishino
- Applicant: Disco Corporation
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: JP2011-228971 20111018
- Main IPC: B23K26/14
- IPC: B23K26/14 ; B23K26/08 ; B23K26/03 ; H01L21/67 ; G01N21/71 ; G01N21/73 ; H01L21/66 ; B23K26/40 ; H01L33/00

Abstract:
A laser processing apparatus removes a sapphire substrate from an optical device wafer configured by forming an optical device layer on the front side of the sapphire substrate through a buffer layer. A chuck table holds the optical device wafer. A pulsed laser beam is applied to the optical device wafer to break the buffer layer, and the light intensity of plasma light produced in the buffer layer by the application of the pulsed laser beam is detected and displayed. The light intensity of a predetermined wavelength region of the plasma light generated from a substance forming the buffer layer is detected.
Public/Granted literature
- US20130092669A1 LASER PROCESSING APPARATUS INCLUDING PLASMA DETECTING MEANS Public/Granted day:2013-04-18
Information query
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