Invention Grant
US09174380B2 Self-cleaning plasticizing venting and extruding apparatus by co-rotating non-twin multi-screws and method thereof
有权
通过同向旋转的非双螺杆多螺杆自清洁塑化排气和挤出装置及其方法
- Patent Title: Self-cleaning plasticizing venting and extruding apparatus by co-rotating non-twin multi-screws and method thereof
- Patent Title (中): 通过同向旋转的非双螺杆多螺杆自清洁塑化排气和挤出装置及其方法
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Application No.: US13703894Application Date: 2011-06-09
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Publication No.: US09174380B2Publication Date: 2015-11-03
- Inventor: Baiping Xu , Meigui Wang , Liang He , Ping Kong , Jinwei Chen
- Applicant: Baiping Xu , Meigui Wang , Liang He , Ping Kong , Jinwei Chen
- Applicant Address: CN Guangzhou
- Assignee: GUANGDONG INDUSTRY TECHNICAL COLLEGE
- Current Assignee: GUANGDONG INDUSTRY TECHNICAL COLLEGE
- Current Assignee Address: CN Guangzhou
- Agency: Davis Wright Tremaine LLP
- Priority: CN201010201316 20100612; CN201110149868 20110607
- International Application: PCT/CN2011/075550 WO 20110609
- International Announcement: WO2011/153951 WO 20111215
- Main IPC: B29C47/40
- IPC: B29C47/40 ; B29C47/76 ; B29C47/08 ; B29C47/60 ; B29C47/62 ; B29C47/66 ; B29C47/00

Abstract:
A self-cleaning plasticizing venting and extruding apparatus by co-rotating non-twin multi-screws and a method thereof are provided, said apparatus comprises a screw mechanism, barrel, feeding port, venting port, discharging port, and driving mechanism. Said screw mechanism comprises non-uniform central screw and lateral screws, the axis of the central screw coincides with the barrel, and the lateral screws are provided on both sides of the central screw and engaged with the central screw; the contour lines of the threads of said central screw and said lateral screws are tangent to the inner wall of the barrel; and said driving mechanism is connected to the central screw and lateral screws. Each screw-uses an asymmetrical flow channel shape, so the flow space is asymmetric, and the compounding intensity and effectiveness enhanced. The dispersion and mixing effects are excellent, generating a self-cleaning effect. The system is suitable for high yield nano-material processing.
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