Invention Grant
- Patent Title: Immersion tin silver plating in electronics manufacture
- Patent Title (中): 在电子制造中浸锡锡镀银
-
Application No.: US12607375Application Date: 2009-10-28
-
Publication No.: US09175400B2Publication Date: 2015-11-03
- Inventor: Yung-Herng Yau , Xingping Wang , Cai Wang , Robert Farrell , Pingping Ye , Edward J. Kudrak, Jr. , Karl F. Wengenroth , Joseph A. Abys
- Applicant: Yung-Herng Yau , Xingping Wang , Cai Wang , Robert Farrell , Pingping Ye , Edward J. Kudrak, Jr. , Karl F. Wengenroth , Joseph A. Abys
- Applicant Address: US CT West Haven
- Assignee: Enthone Inc.
- Current Assignee: Enthone Inc.
- Current Assignee Address: US CT West Haven
- Agency: Senniger Powers LLP
- Main IPC: C23C18/54
- IPC: C23C18/54 ; C23C18/48

Abstract:
A method is provided for depositing a whisker resistant tin-based coating layer on a surface of a copper substrate. The method is useful for preparing an article comprising a copper substrate having a surface; and a tin-based coating layer on the surface of the substrate, wherein the tin-based coating layer has a thickness between 0.5 micrometers and 1.5 micrometers and has a resistance to formation of copper-tin intermetallics, wherein said resistance to formation of copper-tin intermetallics is characterized in that, upon exposure of the article to at least seven heating and cooling cycles in which each cycle comprises subjecting the article to a temperature of at least 217° C. followed by cooling to a temperature between about 20° C. and about 28° C., there remains a region of the tin coating layer that is free of copper that is at least 0.25 micrometers thick.
Public/Granted literature
- US20110097597A1 IMMERSION TIN SILVER PLATING IN ELECTRONICS MANUFACTURE Public/Granted day:2011-04-28
Information query
IPC分类: