Invention Grant
- Patent Title: Method of optical analysis using reference cell and base plate correction and apparatus thereof
- Patent Title (中): 使用参考电池和基板校正的光学分析方法及其装置
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Application No.: US12734067Application Date: 2008-10-29
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Publication No.: US09176049B2Publication Date: 2015-11-03
- Inventor: Koji Fujimoto , Kotaro Shinozaki , Shigeru Kitamura
- Applicant: Koji Fujimoto , Kotaro Shinozaki , Shigeru Kitamura
- Applicant Address: JP
- Assignee: Arkray Inc
- Current Assignee: Arkray Inc
- Current Assignee Address: JP
- Agency: Fishman Stewart Yamaguchi PLLC
- Priority: JP2007-282001 20071030
- International Application: PCT/JP2008/069686 WO 20081029
- International Announcement: WO2009/057659 WO 20090507
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/25 ; G01N21/07 ; G01N21/78 ; G01N21/03
Abstract:
A method for analyzing a sample includes the step of irradiating a reaction portion of a sample BL and a reagent 40 in a reaction cell 34A of an analysis unit with light to obtain data D0 indicating optical characteristics of this portion. The method further includes the steps of irradiating a reference cell 34B which is not provided with a reagent 40 with light in a state in which the sample BL is supplied to the cell to obtain reference data D1 indicating optical characteristics of this portion, irradiating a base portion 34C of the analysis unit with light to obtain reference data D2 indicating optical characteristics of this portion, and obtaining data D3 indicating optical characteristics of the sample BL before reaction with the reagent 40 based on the reference data D1 and D2.
Public/Granted literature
- US20100209964A1 METHOD AND APPARATUS FOR ANALYZING SAMPLE Public/Granted day:2010-08-19
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