Invention Grant
- Patent Title: Pattern transfer method and apparatus
- Patent Title (中): 图案转印方法和装置
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Application No.: US13582083Application Date: 2011-03-02
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Publication No.: US09176376B2Publication Date: 2015-11-03
- Inventor: Hiroshi Mataki
- Applicant: Hiroshi Mataki
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-046804 20100303
- International Application: PCT/JP2011/055429 WO 20110302
- International Announcement: WO2011/108750 WO 20110909
- Main IPC: B05D5/00
- IPC: B05D5/00 ; G03F7/00 ; B82Y10/00 ; B82Y40/00

Abstract:
A method of performing pattern transfer includes the steps of: applying liquid to a substrate, while performing relative movement of the substrate and a liquid ejection head having a plurality of nozzles, by performing ejection and deposition of a plurality of droplets of the liquid from the nozzles onto the substrate in a state where a shape of each of the droplets upon the deposition is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate; and curing the liquid that has been applied to the substrate in the applying step while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid.
Public/Granted literature
- US20130004669A1 PATTERN TRANSFER METHOD AND APPARATUS Public/Granted day:2013-01-03
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