Invention Grant
- Patent Title: Method for adjusting an illumination system of a projection exposure apparatus for projection lithography
- Patent Title (中): 用于调整用于投影光刻的投影曝光装置的照明系统的方法
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Application No.: US13421024Application Date: 2012-03-15
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Publication No.: US09176390B2Publication Date: 2015-11-03
- Inventor: Michael Layh , Markus Deguenther
- Applicant: Michael Layh , Markus Deguenther
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102011005881 20110322
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03B27/52 ; G03B27/72 ; G03B27/32 ; G03F7/20 ; G03B27/54

Abstract:
A method includes moving a correction device into a neutral position; subsequently ascertaining, for a given arrangement of imaging light channels in the illumination optical unit of the projection exposure apparatus, intensity distributions of at least some of the individual imaging light partial beams along a transverse coordinate transverse to a displacement direction of an object to be imaged; subsequently ascertaining, in dependence on the transverse coordinate, an actual variation of actual values of structure image sizes of object structures in an image field, onto which the object is imaged; and subsequently specifying a predetermined variation of the structure image sizes over the transverse coordinate and displacing correction elements of the correction device, starting from the neutral position, such that the actual variation matches the predetermined variation within a tolerance bandwidth. The method can provide improved imaging results as compared to known uniformity adjustment.
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