Invention Grant
- Patent Title: Apparatus for transferring a substrate in a lithography system
- Patent Title (中): 用于在光刻系统中传送衬底的装置
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Application No.: US13460239Application Date: 2012-04-30
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Publication No.: US09176397B2Publication Date: 2015-11-03
- Inventor: Vincent Sylvester Kuiper , Erwin Slot , Marcel Nicolaas Jacobus Van Kervinck , Guido De Boer , Hendrik Jan De Jong
- Applicant: Vincent Sylvester Kuiper , Erwin Slot , Marcel Nicolaas Jacobus Van Kervinck , Guido De Boer , Hendrik Jan De Jong
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; H01L21/67 ; H01L21/677

Abstract:
An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.
Public/Granted literature
- US20130044305A1 Apparatus for transferring a substrate in a lithography system Public/Granted day:2013-02-21
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