Invention Grant
US09176397B2 Apparatus for transferring a substrate in a lithography system 有权
用于在光刻系统中传送衬底的装置

Apparatus for transferring a substrate in a lithography system
Abstract:
An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.
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