Invention Grant
US09177970B2 Semiconductor device, method of manufacturing the same, method of manufacturing display unit, and method of manufacturing electronic apparatus 有权
半导体装置及其制造方法,显示装置的制造方法以及电子装置的制造方法

  • Patent Title: Semiconductor device, method of manufacturing the same, method of manufacturing display unit, and method of manufacturing electronic apparatus
  • Patent Title (中): 半导体装置及其制造方法,显示装置的制造方法以及电子装置的制造方法
  • Application No.: US14186170
    Application Date: 2014-02-21
  • Publication No.: US09177970B2
    Publication Date: 2015-11-03
  • Inventor: Koichi Amari
  • Applicant: Joled Inc.
  • Applicant Address: JP Tokyo
  • Assignee: Joled Inc.
  • Current Assignee: Joled Inc.
  • Current Assignee Address: JP Tokyo
  • Agency: K&L Gates LLP
  • Priority: JP2013-041728 20130304
  • Main IPC: H01L27/14
  • IPC: H01L27/14 H01L27/12
Semiconductor device, method of manufacturing the same, method of manufacturing display unit, and method of manufacturing electronic apparatus
Abstract:
A semiconductor device includes: a gate electrode and a wiring; a first insulating film covering the gate electrode and the wiring; a semiconductor film opposed to the gate electrode with the first insulating film in between; a first concave section located in a position adjacent to the semiconductor film; a connection hole, the connection hole being provided in the first insulating film, and the connection hole reaching the wiring, and a first electrically-conductive film, the first electrically-conductive film being electrically connected to the wiring through the connection hole, and the first electrically-conductive film being buried in the first concave section.
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