Invention Grant
US09178022B2 Precursor composition and method for forming amorphous conductive oxide film
有权
前体组合物和形成非晶导电氧化物膜的方法
- Patent Title: Precursor composition and method for forming amorphous conductive oxide film
- Patent Title (中): 前体组合物和形成非晶导电氧化物膜的方法
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Application No.: US13809993Application Date: 2011-07-08
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Publication No.: US09178022B2Publication Date: 2015-11-03
- Inventor: Tatsuya Shimoda , Jinwang Li
- Applicant: Tatsuya Shimoda , Jinwang Li
- Applicant Address: JP Kawaguchi-shi
- Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Current Assignee Address: JP Kawaguchi-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-159475 20100714
- International Application: PCT/JP2011/066165 WO 20110708
- International Announcement: WO2012/008554 WO 20120119
- Main IPC: H01L29/22
- IPC: H01L29/22 ; C01G55/00 ; H01B1/08 ; H01L29/49 ; H01L29/786 ; H01L21/02
Abstract:
The present invention provides a precursor composition for forming a conductive oxide film having high conductivity and a stable amorphous structure maintained even after heated at high temperature by a simple liquid phase process. The precursor composition of the present invention contains at least one selected from the group consisting of carboxylates, nitrates and sulfates of lanthanoids (but, except for cerium); at least one selected from the group consisting of carboxylates, nitrosyl carboxylates, nitrosyl nitrates and nitrosyl sulfates of ruthenium, iridium or rhodium; and a solvent containing at least one selected from the group consisting of carboxylic acids, alcohols and ketones.
Public/Granted literature
- US20130112973A1 PRECURSOR COMPOSITION AND METHOD FOR FORMING AMORPHOUS CONDUCTIVE OXIDE FILM Public/Granted day:2013-05-09
Information query
IPC分类:
