Invention Grant
- Patent Title: MOS type semiconductor device
- Patent Title (中): MOS型半导体器件
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Application No.: US14019269Application Date: 2013-09-05
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Publication No.: US09178049B2Publication Date: 2015-11-03
- Inventor: Manabu Takei
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki
- Priority: JP2012-196080 20120906
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/40 ; H01L29/66

Abstract:
A MOS type semiconductor device wherein on voltage is low, the rate of rise of current at turn-on time is low, and it is possible to hold down the rate of rise of collector current at turn-on time, and reduce radiation noise. The device includes a stripe-shaped plan-view pattern of protruding semiconductor region on an n-type substrate and having a p-type region sandwiched between an upper side n-type first region and a lower side n-type second region, a top flat portion including a depression region with a depth reaching the p-type region, and an inclined portion between the top flat portion and a bottom flat portion around the protruding semiconductor region; and a gate electrode with one end portion of the gate electrode on a surface within the inclined portion, and another end portion on a surface of the lower side n-type second region in the p-type region side vicinity.
Public/Granted literature
- US20140061719A1 MOS TYPE SEMICONDUCTOR DEVICE Public/Granted day:2014-03-06
Information query
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