Invention Grant
- Patent Title: Resistive memory structure
- Patent Title (中): 电阻记忆结构
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Application No.: US13952678Application Date: 2013-07-29
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Publication No.: US09178143B2Publication Date: 2015-11-03
- Inventor: Frederick T. Chen , Pei-Yi Gu
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L45/00

Abstract:
A resistive memory structure including at least one reactive layer, at least one electrode, and at least one resistance-changing material is provided. The reactive layer extends along a first direction and a second direction. The electrode extends at least along a third direction, wherein the first direction, the second direction, and the third direction are different from each other. At least part of the resistance-changing material is disposed between the reactive layer and the electrode. When ions diffuse from the resistance-changing material to the reactive layer or from the reactive layer to the resistance-changing material, resistance of the resistance-changing material changes.
Public/Granted literature
- US20150028281A1 RESISTIVE MEMORY STRUCTURE Public/Granted day:2015-01-29
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