Invention Grant
- Patent Title: Electrochemical device including amorphous metal oxide
- Patent Title (中): 包括无定形金属氧化物的电化学装置
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Application No.: US13721908Application Date: 2012-12-20
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Publication No.: US09178219B2Publication Date: 2015-11-03
- Inventor: Jun Yang , Patrick Pietrasz , Chunchuan Xu , Richard E. Soltis , Mark S. Sulek , Robert F. Novak
- Applicant: Ford Global Technologies LLC
- Applicant Address: US MI Dearborn
- Assignee: Ford Global Technologies, LLC
- Current Assignee: Ford Global Technologies, LLC
- Current Assignee Address: US MI Dearborn
- Agency: Brooks Kushman P.C.
- Agent Damian Porcari
- Main IPC: H01M4/02
- IPC: H01M4/02 ; H01M4/88 ; H01M8/10

Abstract:
In one or more embodiments, an electrochemical device includes a substrate having a substrate surface; an amorphous metal oxide layer supported on the substrate surface; and a noble metal catalyst supported on the amorphous metal oxide layer to form a catalyst layer. The amorphous metal oxide layer may contact only 25 to 75 percent of the substrate surface. The amorphous metal oxide layer may include less than 10 weight percent of crystalline metal oxide. In certain instances, the amorphous metal oxide layer is substantially free of crystalline metal oxide.
Public/Granted literature
- US20140178801A1 Electrochemical Device Including Amorphous Metal Oxide Public/Granted day:2014-06-26
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