Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US14165988Application Date: 2014-01-28
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Publication No.: US09184251B2Publication Date: 2015-11-10
- Inventor: Li-Fan Lin , Hsuan-Wen Chen
- Applicant: Delta Electronics, Inc.
- Applicant Address: TW Taoyuan
- Assignee: DELTA ELECTRONCIS, INC.
- Current Assignee: DELTA ELECTRONCIS, INC.
- Current Assignee Address: TW Taoyuan
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW102135485A 20130930
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L27/088 ; H01L29/78 ; H01L29/417 ; H01L29/778 ; H01L29/06 ; H01L29/20

Abstract:
A semiconductor device includes a substrate and a plurality of transistors arranged on the substrate in an array. The transistor includes a first electrode, a plurality of second electrodes, and a gate electrode. The second electrodes are arranged around the first electrode. The gate electrode is located between the first electrode and the second electrodes. The first electrode is a circle or polygon. The gate electrode is around the first electrode, and an edge of the gate electrode facing the first electrode has a shape corresponding to that of the first electrode.
Public/Granted literature
- US20150091095A1 SEMICONDUCTOR DEVICE Public/Granted day:2015-04-02
Information query
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