Invention Grant
- Patent Title: Power semiconductor device and method for manufacturing the same
- Patent Title (中): 功率半导体器件及其制造方法
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Application No.: US14448056Application Date: 2014-07-31
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Publication No.: US09184267B1Publication Date: 2015-11-10
- Inventor: Jium Ming Lin
- Applicant: CHUNG HUA UNIVERSITY
- Applicant Address: TW Hsinchu
- Assignee: CHUNG HUA UNIVERSITY
- Current Assignee: CHUNG HUA UNIVERSITY
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C.
- Agent Anthony King
- Main IPC: H01L29/73
- IPC: H01L29/73 ; H01L29/739 ; H01L29/66 ; H01L21/768

Abstract:
A power semiconductor device comprises a substrate, a first electrode, a conductive layer, at least one electrical connecting element, a plurality of doped semiconductor layers, an insulating layer, and a second electrode. The first electrode is formed on a surface of the substrate. The conductive layer is formed on another surface of the substrate. The electrical connecting element is formed through the substrate and electrically connects the first electrode and the conductive layer. The doped semiconductor layers are stacked on the conductive layer. The upper most semiconductor layer comprises two doped sub-regions. The insulating layer is formed on the plurality of doped semiconductor layers. The second electrode is formed on the insulating layer and at least extends on an area between the doped sub-regions.
Information query
IPC分类: