Invention Grant
US09184553B2 Gate-tunable graphene-ferroelectric hybrid structure for photonics and plasmonics
有权
用于光子学和等离子体激元的栅极可调石墨烯 - 铁电混合结构
- Patent Title: Gate-tunable graphene-ferroelectric hybrid structure for photonics and plasmonics
- Patent Title (中): 用于光子学和等离子体激元的栅极可调石墨烯 - 铁电混合结构
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Application No.: US14405671Application Date: 2013-06-06
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Publication No.: US09184553B2Publication Date: 2015-11-10
- Inventor: Barbaros Özyilmaz , Guang Xin Ni , Yi Zheng
- Applicant: National University of Singapore
- Applicant Address: SG Singapore
- Assignee: National University of Singapore
- Current Assignee: National University of Singapore
- Current Assignee Address: SG Singapore
- Agency: Hamilton, Brook, Smith & Reynolds, P.C.
- International Application: PCT/SG2013/000237 WO 20130606
- International Announcement: WO2013/184072 WO 20131212
- Main IPC: H01S3/11
- IPC: H01S3/11 ; H01S3/067 ; H01S3/094 ; G02F1/35 ; C23C16/04 ; C23C16/26 ; C23C16/44
Abstract:
The invention relates to a novel type of gate-tunable photonics and plasmonics which utilizes doped large-scale graphene coupled with ferroelectric material. The graphene-ferroelectric hybrid structure paves the way for the realization of ultra-fast, low power consumption and multi-wavelength operation saturable absorbers for applications in ultra-fast laser systems and novel types of plasmonics for applications in infrared detection, single-photon quantum devices and ultrasensitive detectors.
Public/Granted literature
- US20150155681A1 Gate-Tunable Graphene-Ferroelectric Hybrid Structure for Photonics and Plasmonics Public/Granted day:2015-06-04
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