Invention Grant
US09188869B2 Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern
有权
制造含有相分离结构的结构的方法，形成图案的方法和形成精细图案的方法
- Patent Title: Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern
- Patent Title (中): 制造含有相分离结构的结构的方法，形成图案的方法和形成精细图案的方法
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Application No.: US14445556Application Date: 2014-07-29
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Publication No.: US09188869B2Publication Date: 2015-11-17
- Inventor: Takehiro Seshimo , Takahiro Dazai , Takaya Maehashi , Ken Miyagi , Yoshiyuki Utsumi
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2013-159897 20130731
- Main IPC: G03F7/40
- IPC: G03F7/40 ; G03F7/20 ; G03F7/42 ; C08L3/00 ; C08L33/12
Abstract:
A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer.
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