Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US14462831Application Date: 2014-08-19
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Publication No.: US09190154B2Publication Date: 2015-11-17
- Inventor: Hiroyuki Kutsukake
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G11C16/12
- IPC: G11C16/12 ; G11C16/04

Abstract:
The voltage switching circuit comprises: an nMOS transistor having a gate connected to a first terminal that outputs an output voltage, a drain connected to a power-supply terminal, and a source connected to a second terminal; a first pMOS transistor having a source connected to the second terminal, a drain connected to the first terminal, and a gate provided with a first or second voltage, a source and a well thereof being short-circuited; and a switching circuit connected between a third terminal that supplies the input voltage and the first terminal and configured to turn on when the output voltage is supplied to the first terminal. A gate electrode of the first pMOS transistor is configured by semiconductor including p-type impurity. A concentration of p-type impurity in the gate electrode of the memory cell is different from that of the first pMOS transistor.
Public/Granted literature
- US20150262684A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2015-09-17
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