A display device and a fabrication method thereof are provided. In a dual-link structure for a narrow bezel, first link wirings are formed on the same layer that the gate lines are formed and second link wirings are formed on the same layer that the data lines are formed. The first link wirings and the second link wirings are formed in a non-display area. Or auxiliary link wirings are further formed over the first link wirings and the second link wirings respectively. Or the first link wiring and second link wiring are divided two pieces of sub-link wirings. The sub-link wirings consisting the one link wiring are connected respectively and are formed on the different layer, whereby a defective image due to a difference in resistance between neighboring link wirings can be improved.