Invention Grant
US09190432B2 Oxide thin-film transistor array substrate, manufacturing method thereof and display panel 有权
氧化物薄膜晶体管阵列基板,其制造方法和显示面板

  • Patent Title: Oxide thin-film transistor array substrate, manufacturing method thereof and display panel
  • Patent Title (中): 氧化物薄膜晶体管阵列基板,其制造方法和显示面板
  • Application No.: US14355330
    Application Date: 2013-04-24
  • Publication No.: US09190432B2
    Publication Date: 2015-11-17
  • Inventor: Shuang Sun
  • Applicant: BOE TECHNOLOGY GROUP CO., LTD.
  • Applicant Address: CN Beijing
  • Assignee: BOE TECHNOLOGY GROUP CO., LTD
  • Current Assignee: BOE TECHNOLOGY GROUP CO., LTD
  • Current Assignee Address: CN Beijing
  • Agency: Collard & Roe, P.C.
  • Priority: CN201310063256 20130228
  • International Application: PCT/CN2013/074633 WO 20130424
  • International Announcement: WO2014/131236 WO 20140904
  • Main IPC: H01L27/12
  • IPC: H01L27/12
Oxide thin-film transistor array substrate, manufacturing method thereof and display panel
Abstract:
An oxide thin-film transistor (TFT) array substrate, a manufacturing method thereof and a display panel are provided. In the manufacturing method, a pattern of a gate insulating layer (13), an oxide active layer (14) and an etch barrier layer (15) is formed on a substrate (10) on which a pattern of a gate line (11) and a gate electrode (12) is formed, by one patterning process.
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