Invention Grant
US09190483B2 AlN single crystal Schottky barrier diode and method of producing the same
有权
AlN单晶肖特基势垒二极管及其制造方法
- Patent Title: AlN single crystal Schottky barrier diode and method of producing the same
- Patent Title (中): AlN单晶肖特基势垒二极管及其制造方法
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Application No.: US14374331Application Date: 2013-01-30
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Publication No.: US09190483B2Publication Date: 2015-11-17
- Inventor: Yoshihiro Irokawa , Kiyoshi Shimamura , Encarnacion Antonia Garcia Villora
- Applicant: National Institute for Materials Science
- Applicant Address: JP Tsukuba-shi, Ibaraki
- Assignee: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee Address: JP Tsukuba-shi, Ibaraki
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2012-016926 20120130
- International Application: PCT/JP2013/052086 WO 20130130
- International Announcement: WO2013/115269 WO 20130808
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L29/872 ; H01L29/66 ; H01L29/45 ; H01L29/47

Abstract:
An AlN single crystal Schottky barrier diode including: an AlN single crystal substrate having a defect density of 106 cm−2 or less and a thickness of 300 μm or more; a first electrode formed on one surface of the AlN single crystal substrate; and a second electrode formed on one surface of the AlN single crystal substrate while being spaced apart from the first electrode, the AlN single crystal Schottky barrier diode being provided with: a rectifying property such that an on-off ratio at the time of applying 10 V and −40 V is at least 103 even at a high temperature of 573 K; a high voltage resistance such that a voltage can be applied at least within a range of −40 V to 10 V; and a low on-resistance characteristic such that a current begins to flow at no greater than 5 V.
Public/Granted literature
- US09159800B2 AlN single crystal Schottky barrier diode and method of producing the same Public/Granted day:2015-10-13
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