Invention Grant
US09192994B2 Method for producing substrate having dispersed particles of dendrimer compound on the surface thereof, and substrate having dispersed particles of dendrimer compound on the surface thereof
有权
表面具有树枝状大分子化合物的分散粒子的基材的制造方法以及具有树枝状大分子化合物的分散粒子的基材的表面
- Patent Title: Method for producing substrate having dispersed particles of dendrimer compound on the surface thereof, and substrate having dispersed particles of dendrimer compound on the surface thereof
- Patent Title (中): 表面具有树枝状大分子化合物的分散粒子的基材的制造方法以及具有树枝状大分子化合物的分散粒子的基材的表面
-
Application No.: US13567926Application Date: 2012-08-06
-
Publication No.: US09192994B2Publication Date: 2015-11-24
- Inventor: Isao Hirano , Kimihisa Yamamoto , Takane Imaoka
- Applicant: Isao Hirano , Kimihisa Yamamoto , Takane Imaoka
- Applicant Address: JP Kawasaki-Shi JP Tokyo
- Assignee: TOKYO OHKA KOGYO CO., LTD.,TOKYO INSTITUTE OF TECHNOLOGY
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.,TOKYO INSTITUTE OF TECHNOLOGY
- Current Assignee Address: JP Kawasaki-Shi JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2011-172578 20110808
- Main IPC: B05D1/02
- IPC: B05D1/02 ; B23B3/14 ; C08G83/00 ; B32B3/00 ; B82Y30/00 ; C09D201/00
Abstract:
A method for producing a substrate having dispersed particles of a dendrimer compound on the surface thereof, the method including: an application step including dissolving a phenyl azomethine dendrimer compound in a solvent to prepare a solution, and applying the solution on the surface of a substrate; and a volatilization step including volatilizing the solvent from the solution applied on the surface of the substrate, the phenyl azomethine dendrimer compound included in the solution having a concentration of no greater than 5 μmol/L is employed.
Public/Granted literature
Information query
