Invention Grant
US09195150B2 Lithographic apparatus comprising a support for holding an object, and a support for use therein
有权
光刻设备包括用于保持物体的支撑件和用于其中的支撑件
- Patent Title: Lithographic apparatus comprising a support for holding an object, and a support for use therein
- Patent Title (中): 光刻设备包括用于保持物体的支撑件和用于其中的支撑件
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Application No.: US14377141Application Date: 2013-02-04
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Publication No.: US09195150B2Publication Date: 2015-11-24
- Inventor: Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- International Application: PCT/EP2013/052154 WO 20130204
- International Announcement: WO2013/117518 WO 20130815
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; H01L21/687
Abstract:
A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Public/Granted literature
- US20150002832A1 Lithographic Apparatus Comprising a Support for Holding an Object, and a Support for Use therein Public/Granted day:2015-01-01
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