Invention Grant
- Patent Title: Charged particle beam drawing apparatus and drawing chamber
- Patent Title (中): 带电粒子束绘图装置和绘图室
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Application No.: US14326997Application Date: 2014-07-09
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Publication No.: US09196458B2Publication Date: 2015-11-24
- Inventor: Hiroyasu Saito , Yoshinori Nakagawa , Seiichi Nakazawa
- Applicant: NuFlare Technology, Inc
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-148593 20130717; JP2014-128883 20140624
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/317 ; H01J37/16
Abstract:
A charged particle beam drawing apparatus includes: a stage configured to support a specimen as a drawing target; and an airtight drawing chamber formed into a box shape provided with a side wall and a bottom plate, and configured to house the stage. The bottom plate includes: multiple support portions connected to the side wall and configured to support the stage; and a curved portion connected to the support portions and having a convex shape curved outward.
Public/Granted literature
- US09165747B2 Charged particle beam drawing apparatus and drawing chamber Public/Granted day:2015-10-20
Information query
