Invention Grant
- Patent Title: Photolytic processing of materials with hydrogen
- Patent Title (中): 氢解材料的光解加工
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Application No.: US13155947Application Date: 2011-06-08
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Publication No.: US09196497B2Publication Date: 2015-11-24
- Inventor: Orin W. Holland , Ryan J. Cottier , Terry D. Golding , Khalid Hossain , Ronald Paul Hellmer
- Applicant: Orin W. Holland , Ryan J. Cottier , Terry D. Golding , Khalid Hossain , Ronald Paul Hellmer
- Applicant Address: US OK Ardmore
- Assignee: Amethyst Research, Inc.
- Current Assignee: Amethyst Research, Inc.
- Current Assignee Address: US OK Ardmore
- Agency: Tomlinson Rust McKinstry Grable
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/30 ; H01L21/302
Abstract:
An apparatus and method for hydrogenating a sample, such as a semiconductor wafer. The invention utilizes a top electrode comprising a UV-transparent dielectric and a metal contact to provide an electric field to the sample while the sample is irradiated with UV light and hydrogenated with a hydrogenating gas or gasses. The field may be applied to the sample at a number of different pressures, temperatures and concentrations of gas to manipulate the rate and type of hydrogenation. Further, the method of hydrogenating the sample may be used in conjunction with masking and etching techniques.
Public/Granted literature
- US20110297534A1 Photolytic Processing Of Materials With Hydrogen Public/Granted day:2011-12-08
Information query
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