Invention Grant
US09198843B2 Process for manufacturing of high surface area USP grade nano-anatase base
有权
高表面积USP级纳米锐钛矿基底制造工艺
- Patent Title: Process for manufacturing of high surface area USP grade nano-anatase base
- Patent Title (中): 高表面积USP级纳米锐钛矿基底制造工艺
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Application No.: US12462821Application Date: 2009-08-11
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Publication No.: US09198843B2Publication Date: 2015-12-01
- Inventor: Jan R Prochazka
- Applicant: Jan R Prochazka
- Main IPC: A61K8/29
- IPC: A61K8/29 ; A61Q17/04 ; B82Y5/00 ; A61K8/02 ; C01G23/047 ; C01G23/053 ; C01G23/08

Abstract:
The present invention provides a novel manufacturing process for producing a high surface area USP grade titanium dioxide in the nano-anatase form. In a manufacturing method aspect of the present invention, a process of producing a high surface area USP grade TiO2 nano-anatase base is provided. The method involves steps of: a) phosphorus doping of the titanium hydrate obtained in hydrolysis of a titanium compound; b) drying and calcination of the doped paste, thereby producing a high surface area USP grade titanium dioxide in the anatase crystal form with nano-particles suitable for UV screens and cosmetics.
Public/Granted literature
- US20100150852A1 Process for manufacturing of high surface area USP grade nano-anatase base Public/Granted day:2010-06-17
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