Invention Grant
US09198843B2 Process for manufacturing of high surface area USP grade nano-anatase base 有权
高表面积USP级纳米锐钛矿基底制造工艺

Process for manufacturing of high surface area USP grade nano-anatase base
Abstract:
The present invention provides a novel manufacturing process for producing a high surface area USP grade titanium dioxide in the nano-anatase form. In a manufacturing method aspect of the present invention, a process of producing a high surface area USP grade TiO2 nano-anatase base is provided. The method involves steps of: a) phosphorus doping of the titanium hydrate obtained in hydrolysis of a titanium compound; b) drying and calcination of the doped paste, thereby producing a high surface area USP grade titanium dioxide in the anatase crystal form with nano-particles suitable for UV screens and cosmetics.
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