Invention Grant
US09199829B2 Assembly and a method for lifting a module of a lithography system in a vertical direction and a lithography system comprising such assembly
有权
组装和用于在垂直方向上提升光刻系统的模块的方法以及包括这种组件的光刻系统
- Patent Title: Assembly and a method for lifting a module of a lithography system in a vertical direction and a lithography system comprising such assembly
- Patent Title (中): 组装和用于在垂直方向上提升光刻系统的模块的方法以及包括这种组件的光刻系统
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Application No.: US13610392Application Date: 2012-09-11
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Publication No.: US09199829B2Publication Date: 2015-12-01
- Inventor: Jerry Johannes Martinus Peijster
- Applicant: Jerry Johannes Martinus Peijster
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Priority: NL2007401 20110912
- Main IPC: G03B27/42
- IPC: G03B27/42 ; B66F7/00 ; B62B3/02 ; G03F7/20 ; H01J37/02 ; H01J37/30 ; H01J37/317 ; B82Y10/00 ; B82Y40/00

Abstract:
An assembly and a method for lifting a module of a lithography system from its support and a lithography system including such device are provided. The assembly includes a body and a track. The track comprises a ramp. The body is provided with two wheels. The first wheel vertically may extend a distance h further from a central horizontal plane of the body than the second wheel. An axis of the first wheel may be positioned in the horizontal direction at a distance D from an axis of the second wheel. The track may include a first and a second ramp. The first ramp is positioned at a distance D from the second ramp in the horizontal direction and a distance h in the vertical direction. Insertion of the body between the module and the support causes the module to be lifted from the support.
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