Invention Grant
- Patent Title: Method of manufacturing silica particle dispersion
- Patent Title (中): 二氧化硅颗粒分散体的制造方法
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Application No.: US13359027Application Date: 2012-01-26
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Publication No.: US09199852B2Publication Date: 2015-12-01
- Inventor: Sakae Takeuchi , Shinichiro Kawashima , Hiroyoshi Okuno , Hideaki Yoshikawa , Yasuo Kadokura , Shunsuke Nozaki , Yuka Zenitani
- Applicant: Sakae Takeuchi , Shinichiro Kawashima , Hiroyoshi Okuno , Hideaki Yoshikawa , Yasuo Kadokura , Shunsuke Nozaki , Yuka Zenitani
- Applicant Address: JP Tokyo
- Assignee: FUJI XEROX CO., LTD.
- Current Assignee: FUJI XEROX CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-209275 20110926
- Main IPC: C01B33/146
- IPC: C01B33/146 ; C01B33/18
Abstract:
A method of manufacturing a silica particle dispersion, includes preparing a silica particle dispersion containing silica particles and a solvent, primary concentrating the silica particle dispersion, adding a hydrophobizing treatment agent to the silica particle dispersion after the primary concentrating, and secondary concentrating the silica particle dispersion after the adding.
Public/Granted literature
- US20130075652A1 METHOD OF MANUFACTURING SILICA PARTICLE DISPERSION Public/Granted day:2013-03-28
Information query
IPC分类:
