Invention Grant
- Patent Title: Radiation-sensitive composition and compound
- Patent Title (中): 辐射敏感组合物和化合物
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Application No.: US13415754Application Date: 2012-03-08
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Publication No.: US09200098B2Publication Date: 2015-12-01
- Inventor: Ken Maruyama
- Applicant: Ken Maruyama
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-211069 20090911; JP2010-058358 20100315; JP2010-164305 20100721
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C309/12 ; C07C381/12 ; C08F20/10 ; C07C307/06 ; C07C309/07 ; C07C309/17 ; C08F20/28 ; C08F20/54 ; G03F7/039

Abstract:
A radiation-sensitive composition includes a photoacid generator shown by a general formula (0-1a). Each of R0 individually represents a substituted or unsubstituted organic group which includes a carbon atom, a hydrogen atom, and an oxygen atom, and which includes at least one ester bond, and M+ represents a monovalent onium cation. A compound is shown by a general formula (0). R represents a substituted or unsubstituted organic group which includes a carbon atom, a hydrogen atom, and an oxygen atom, and which includes at least one ester bond, and M+ represents a monovalent onium cation.
Public/Granted literature
- US20120164582A1 RADIATION-SENSITIVE COMPOSITION AND COMPOUND Public/Granted day:2012-06-28
Information query
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